Exceptional gases quiz

While these chemical compounds are scientifically interesting, they serve only as general context for advanced material science and industrial applications rather than being specific topics likely to be asked in the UPSC Mains.

Notes

Chlorine trifluoride is a highly reactive gas and powerful oxidiser used in semiconductor fabrication to remove silicon deposits.
Uranium hexafluoride is a compound that readily sublimes, facilitating the separation of uranium isotopes via centrifuges for nuclear fuel enrichment.
Nitric oxide (NO) is a stable free-radical gas with an unpaired electron, functioning as a biological signalling molecule and a treatment for pulmonary hypertension.
Helium hydride ion (HeH+) is considered the first molecule formed in the universe, characterised by ionic bonds.
Radon difluoride is a radioactive compound demonstrating that radon, a noble gas, can form chemical bonds with fluorine.

Questions

Discuss the significance of noble gas chemistry in modern science, specifically focusing on the reactivity of elements once considered inert. How does the study of such compounds contribute to our understanding of chemical bonding? 150 words

Attempt this — 150 words in 8 min

0 / 150 words 8:00

Prelims

Which of the following gases is primarily used in the semiconductor industry for the removal of silicon deposits due to its powerful oxidising properties?

Which compound is utilised in the nuclear fuel enrichment process to facilitate the separation of uranium isotopes?

Syllabus

Achievements in science & technology: indigenization, new technology GS3

Topics

Science & Technology

Sources

Exceptional gases

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